Batch-type ion beam milling device "IM-580 series"
This is an introduction to a batch-type ion milling device that enables both high uniformity and high throughput.
The "IM-580 Series" is a batch-type ion beam milling device suitable for processing large substrates and a large number of pieces. It features a bucket-type ion source with a maximum diameter of φ580. It can accommodate non-standard substrates such as square-shaped substrates, support mixed non-standard substrates, and is compatible with various substrate sizes. We offer free sample processing tailored to your application for the first time. Please contact us regarding wafer sizes, processing quantities, and other inquiries. 【Features】 ■ Maximum φ580 bucket-type ion source ■ Achieves both high uniformity and high throughput ■ Capable of controlling both high and low etching rates ■ Self-rotating stage for wafers (substrates) ■ Compatible with non-standard substrates such as square-shaped substrates, supports mixed non-standard substrates, and is compatible with various substrate sizes ■ Filament-free μ-wave neutralizer (optional) *For more details, please refer to the external link or feel free to contact us.
- Company：日立ハイテク
- Price：Other
